Electrical

The unit of electric potential is the volt (V), where one volt is one joule per coulomb. One volt is defined as the difference in potential between two points in a conductor which, when carrying a current of one ampere, dissipates a power of one watt, i.e. [latex] \begin{aligned} \text { volts } & =\frac{\text

End effectors require power to operate. They also require control signals to regulate their operation. The principal methods of transmitting power and control signal to the end effector are: Pneumatic Electric Hydraulic Mechanical The method of providing the power to the end effector must be compatible with the capabilities of the robot system. For example,

A capacitor is broadly defined as two conductors that can hold opposite charges. It can be used as either a sensor or an actuator. If the distance and relative position between two conductors change as a result of applied stimulus, the capacitance value would be changed. This forms the basis of capacitive (or electrostatic) sensing.

A MEMS system, including sensors and actuators, invariably consists of mass and supporting structures. The supporting mechanical elements (membranes, cantilever, or suspensions) provide elastic restoring spring constants. Movement of the mass is impeded by collision with air molecules surrounding the mass. This constitutes damping, which is a velocity-dependant resistance force. As such, a MEMS system

Silicon, an element commonly found on sandy beaches and in window glasses, is the substrate of choice for building integrated circuits. Silicon belongs to a class of materials called semiconductors. which offers remarkable electrical characteristics and controllability for electronics circuits. Semiconductor silicon is the most common material in the MEMS field. Naturally, the electrical and

To following is a list of important issues to consider when evaluating an etching process. Etch rate. The speed of material removal is important. A higher etch rate translates into shorter etching time and greater manufacturing throughput. End point detection. Determining that a process step has finished is not as easy as it may sound.

A basic understanding of the fabrication technology for integrated circuit, which precedes that of MEMS in history, is necessary to understanding the micromachining process. A reader who is familiar with the basic microfabrication process of integrated circuits may skip this section. A fabrication process for integrated circuits generally involves many steps of material deposition, material

Plasma etching is a very prominent method of removing materials from a wafer surface. Since the process does not involve wet chemicals, it is often referred to as dry etching. The etching is carried out in a specialized process equipment called the plasma etcher. A chamber with two opposing electrodes is filled with a chemically

These galvanometers are of d’Arsonval type having a moving coil suspended between the pieces of a permanent magnet. When an alternating current is passed through the moving coil, an alternating deflecting torque is produced which makes the coil vibrate with a frequency equal to the frequency of the current passing. On account of inertia of